AZ1505 Process Guideline (David Schreiber)

1 µm feature width, 0.5 µm resist thickness for exposure in MJB3

1. Dehydrate wafer at 200ºC for at least 10 minutes (if possible)

2. Spin coat HMDS

a. Coat sample completely with HMDS

b. Two step spin program:

i. Step 1
Speed: 2000 RPM
Ramp: 1000 RPM/sec
Time: 15 sec

ii. Step 2
Speed: 0 RPM
Ramp: 1000 RPM/sec
Time: 0 sec

3. Spin coat AZ1505

a. Coat sample completely with AZ1505

b. Three step spin program:

i. Step 1
Speed: 500 RPM
Ramp: 100 RPM/sec
Time: 10 sec

ii. Step 2
Speed: 5000 RPM
Ramp: 4500 RPM/sec
Time: 40 sec

iii. Step 2
Speed: 0 RPM
Ramp: 2500 RPM/sec
Time: 0 sec

IMPORTANT: DO NOT FORGET TO CLEAN BACKSIDE OF SAMPLE CHIP WITH Q-TIP AND ACETONE BEFORE SOFT BAKE

4. Soft bake at 110ºC for 1.5 minutes

5. Expose in MJB3 for 1 sec with vacuum or hard contact

6. Develop in AZ726 for 20-30 seconds (small features develop faster)