16:00 Sunday, 26 May 2002
"Exploring and Controlling Film
Instabilities"
Ullrich Steiner, University of
Groningen
Abstract
Surface instabilities of liquids have intrigued
scientists for more than a century and continue to be subject of intensive
research. Apart from the technological importance of thin films,
this is mainly due to the fact that the break-up of thin films sensitively
mirrors the minute forces that act at the film's interface. Thin films
are therefore sensitive measurement devices to detect interfacial
interactions. Technologically, on the other hand, film instabilities are
usually undesired and considerable efforts are made to ensure film stability
during coating processes.
In my presentation, I will give several examples
of different film instabilities. While diverse in terms of their
physical origin, the break-up of films can be described by a single theoretical
framework. In addition, gaining an understanding of the
origins of the film instabilities enables us to control the the morphology
of films after break-up. By exploring simultaneously fundamental
and applied aspects, we benefit from synergies of looking at the problem
of film instabilities from more than one angle.
The following systems will be discussed:
1. Film Instabilities by liquid-liquid demixing
2. Film Instabilities induced by an electric
field
3. Film Instabilities caused by temperature gradients
4. Applications of film instabilities for functional
films and as lithographic techniques. |